Complex Oxide Sputtering Target Market Trend, Industry Report 2030

The complex oxide sputtering target market was valued at USD 2.2 Billion in 2021. The market is projected to grow USD 6.7 Billion in 2030, at a CAGR of 5.5%. A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. Arc-melting or radio-frequency melting of a mixture of metals in a vacuum or inert-gas atmosphere can easily produce multielemental alloy sputtering targets.